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透明非晶态氧化物半导体薄膜晶体管(TAOS-TFT)以其诸多优势受到研究人员的青睐,最近几年发展迅速.文章以传统薄膜晶体管做对照,详细介绍了TAOS-TFT的原理、结构和性能,总结出TAOS-TFT相对于Si基TFT具有制备温度低、均一性好、迁移率高、对可见光全透明和阈值电压低等5方面的优势,指出了TAOS-TFT在进一步实用化过程中所面临的几个重要问题,其中最为重要的是需要尽快建立自身的集约化物理模型.

参考文献

[1] Kagan C R,Andry P.Thin-Film Ttransistors[M].New York:Marcel Dekker,2003.
[2] 黄锡珉.有源矩阵OLED[J].液晶与显示,2003,18(3):157-160.
[3] 李文连.有机电致发光显示屏技术[J].液晶与显示,2003,17(4):259-264.
[4] 杨澍,荆海,廖燕平,等.驱动电子墨水电子纸的柔性TFT背板制造技术[J].液晶与显示,2007,22(2):167-175.
[5] Hoffman R L,Norris B J,Wager J F,et al.ZnO-based transparent thin-film transistors[J].Appl.Phys.Lett.,2003,82(5):733-735.
[6] Wager J F.Transparent Electronics[J].Science,2003,300(5623):1245-1246.
[7] Wager J F,Keszler D A,Presley R E.Transparent Electronics[M].Berlin:Springer,2007.
[8] Hsieh H H,Wu C C.Amorphous ZnO transparent thin-film transistors fabricated by fully lithographic and etching processes[J].Appl.Phys.Lett.,2007,91(1):013502(1-3).
[9] Chung J H,Lee J Y,Kim H S,et al.Effect of thickness of ZnO active layer on ZnO-TFT's characteristics[J].Thin Solid Films,2008,516(16):5597-5601.
[10] Nomura K,Ohta H,Takagi A,et al.Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors[J].Nature,2004,432(25):488-492.
[11] Cho D H,Shinhyuk Y,Jaeheon S,et al.Post-annealing and passivations of transparent bottom gate IGZO thin film transistors[C].//SID08 Digest,San Jose:SID,2008:1243-1246.
[12] Wantae L,SeonHoo K,Wang Y L,et al.High-performance indium gallium zinc oxide transparent thin-film transistors fabricated by radio-frequency sputtering[J].J.The Electrochemical Society,2008,155(6):H383-H385.
[13] Kumomi H,Nomura K,Kamiya T,et al.Amorphous oxide channel TFTs[J].Thin Solid Films,2008,516:1516-1522.
[14] Hsieh H H,Wu C H,Wu C C,et al.Amorphous In2O3-Ga2O3-ZnO thin film transistors and integrated circuits on flexible and colorless polyimide substrates[C]//SID08 Digest,San Jose:SID,2008:1207-1210.
[15] Lim W,Kim S H,Wang W L,et al.Stable room temperature deposited amorphous InGaZnO4 thin film transistors[J].J.Vacuum Science and Technology B,2008,26 (3):959-962.
[16] Wang W L,Lim W,Covert L N,et al.Room temperature deposited enhancement mode and depletion mode indium znic oxide thin film transistors[J].The Electrochemical Society,2008,13 (3):159-164.
[17] Suresh A,Wellenius P,Dhawan A,et al.Room temperature pulsed laser deposited indium gallium zinc oxide channel based transparent thin film transistors[J].Appl.Phys.Lett.,2007,90 (12):123512(1-3).
[18] Choi C G,Seo S J,Baz B S.Solution-processed indium-zinc oxide transparent thin-film transistors[J].Electrochemical and Solid-State Lett.,2008,11(1):H7-H9.
[19] Kim G H,Shin H S,Kim K H,et al.Fabrication of solution processed InGaZnO thin film transistor for active matrix backplane[C]//SID08 Digest,San Jose:SID,2008:1258-1261.
[20] Nomura K,Takagi A,Kamiya T,et al.Amorphous oxide semiconductors for high-performance flexible thin-film transistors[J].Japanese J.Appl.Phys.,2006,45(5B):4303-4308.
[21] Ito M,Miyazaki C,Kon M,et al.Application of amorphous oxide TFT to electrophoretic display[J].J.Non-Crystalline Solids,2008,354(19-25):2777-2782.
[22] 谢强,李宏建,黄永辉,等.几种OLED有源驱动电路中像素单元电路的分析[J].液晶与显示,2004,19(6):462-467.
[23] Hayashi R,Sato A,Ofuji M,et al.Improved Amorphous In-Ga-Zn-O TFTs[C]//SID08 Digest,San Jose:SID,2008:621-624.
[24] Hosono H,Kikuchi N,Ueda N,et al.Working hypothesis to explore novel wide band gap electrically conducting amorphous oxides and examples[J].J.Non-Crystalline Solids,1996,198-220:165-169.
[25] Hosono H,Yasukawa M,Kawazoe H.Novel oxide amorphous semiconductors:transparent conducting amorphous oxides[J].J.Non-Crystalline Solids,1996,203:334-344.
[26] Takagia A,Nomurab K,Ohta H,et al.Carrier transport and electronic structure in amorphous oxide semiconductor,a-InGaZnO4[J].Thin Solid Films,2004,486(1-2):38-41.
[27] Wager J F.Transparent electronics-display applications?[C]//SID07 Digest,San Jose:SID,2007:1824-1825.
[28] Jeong J K,Jeong J H,Choi J H,et al.12.1-Inch WXGA AMOLED display driven by indium-gallium-zinc oxide TFTs array[C]//SID08 Digest,San Jose:SID,2008:1-4.
[29] Lee J H,Kim D H,Yang D J,et al.Worlds Largest (15-inch) XGA AMLCD Panel Using IGZO Oxide TFT[C]//SID08 Digest,San Jose:SID,2008:625-628.
[30] Suresh A,Muth J F.Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors[J].Appl.Phys.Lett.,2008,92(3):033502.
[31] Chung H J,Jeong J H,Ahn T K,et al.Bulk-limited current conduction in amorphous InGaZnO thin films[J].Electrochemical and Solid-State Lett.,2008,11 (3):H51-H54.
[32] Song I,Kim S,Yin H,et al.Short channel characteristics of gallium-indium-zinc-oxide thin film transistors for three-dimensional stacking memory[J].IEEE Electron Device Lett.,2008,29 (6):549-552.
[33] Crawford G P.Flexible Flat Panel Displays[M].New York:John Wiley & Sons,2005.
[34] Hsieh H H,Kamiya T,Nomura K,et al.Modeling of amorphous InGaZnO4 thin film transistors and their subgap density of states[J].Appl.Phys.Lett.,2008,92(13):133503(1-3).
[35] Lee K,Shur M,Fjeldly T A,et al.Semiconductor Device Modeling For VLSI[M].Englewood Cliffs:Prentice Hall,1993.
[36] Grabinski W,Nauwelaers B,Schreurs D.Transistor Level Modeling for Analog/RF IC Design[M].Berlin:Springer,2006.
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