本文用射频反应磁控溅射制备了SiCN薄膜,对薄膜的化学成分、结构进行了研究.结果表明,反应气体N2、Si、C三者之间形成了Si-C、Si-N和C-N键,构成了复杂的网络结构.成分分析表明薄膜的化学计量式近似为SiCN.对比分析了反应溅射制备SiCN、CNx、SiNy和SiCz薄膜的FTIR谱.
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