针对Ni80Fe20/Mo纳米多层膜在实际应用中经常面临的热稳定性问题,研究了多层膜在343～683K温度范围内的互扩散行为,测定了其有效互扩散系数Dλ。小的激活焓来源于多层膜中存在的共格应变。当温度低于483K时,NiFe/Mo多层膜具有较强的抵制NiFe和Mo亚层间互扩散能力,这对NiFe/Mo多层膜今后的实际应用有重要意义。
For improving the thermal stability of magnetic multilayers, the interdiffusion of Ni80Fe20/Mo multilayers between 343～ 683K has been studied by determining the effective interdiffusion coefficient Dλ . The much lower activation enthalpy of diffusion is attributed to the coherence strains existing in the multilayers. As the annealing temperature is below 483K, this result suggests that the Ni80Fe20/Mo multilayers have a strong resistance to the atomic interdiffusion between sublayers. It is signifi－cant to application of NiFe/Mo multilayers.
参考文献
| [1] | Baibich M N;Broto J M;Fert A .[J].Physical Review Letters,1988,61:2472. |
| [2] | Grumberg;Schreiber R;Pang Y et al.[J].Physical Review Letters,1986,57:2442. |
| [3] | Petroff F;Barthelamy A;Leqauien S .[J].Physical Review,1991,B44:535. |
| [4] | Shinjo T;Wu H T;Nastasi M .[J].Journal of Applied Physics,1997,81:637. |
| [5] | Dieny B;Speriosu V S;Parkin S S P et al.[J].Physical Review,1991,B43:1297. |
| [6] | Partin S S P .[J].Applied Physics Letters,1992,60:152. |
| [7] | Yan M L;Lai W Y;Luo G M et al.[J].Journal of Physics:Condensed Matter,1996,8:L711. |
| [8] | 何崇智.X射线衍射技术[M].上海:上海科学技术出版社,1986 |
| [9] | Fontaine D de.Local Atomic Arrangements Studied by X- ray Difffraction[M].New York:gordon and Breach Science Publishers,1996 |
| [10] | Philofsky E M;Hilliard J .[J].Journal of Applied Physics,1969,40:2198. |
| [11] | Fullerton Eric E;Schuller Ivan K;Vanderstraeten H et al.[J].Physical Review,1992,B45:9292. |
| [12] | 高义华,张泽,阎明朗,赖武彦.TABLE OF CONTENTS and ABSTRACTS reprinted from ACTA PHYSICA SINICA, Vol.46, No.8(1997)(in Chinese)[J].ACTA PHYSICA SINICA,1998(05):388. |
| [13] | Gree A L;Spaepen F.Synthetic Modulated Structure Materials[M].New York:Academic Press,1985 |
| [14] | Mclntyre P C;Wu D T;Nastasi M .[J].Journal of Applied Physics,1997,81:637. |
| [15] | Wang W K;Wang W H;Bai H Y.[J].Materials Science and Engineering,1994:234. |
| [16] | Jeon I J;Hong J H;Lee Y P .[J].Journal of Applied Physics,1994,75:7825. |
| [17] | Prokes S M;Spaepen F .[J].Applied Physics Letters,1985,47:234. |
| [18] | Cook H E;Hilliard J E .[J].Journal of Applied Physics,1969,40:2191. |
| [19] | Tsakalakos T;Hilliard J E .[J].Journal of Applied Physics,1984,55:2885. |
| [20] | Tobert W Cahn;Peter Haasen.Physical Metallurgy[M].North- Holland:Elsevier Science,1996 |
| [21] | Zhang M;Wang W K .[J].Physica Status Solidi A,1996,287:293. |
| [22] | Zhang M.;Wang WK. .STRUCTURE AND INTERDIFFUSION IN SPUTTERING-DEPOSITED AG/BI MULTILAYERS[J].Physica Status Solidi, A. Applied Research,1997(2):439-446. |
| [23] | Cahn J W .[J].Acta Materialia,1961,9:795. |
| [24] | Balluffi R W;Blakely I M .[J].THIN SOLID FILMS,1975,25:363. |
| [25] | Kittel Charles.Introduction to Solid State Physics[M].New York:John Wiley and Sons Inc,1986 |
| [26] | Koiwa M .[J].Acta Materialia,1974,22:1259. |
| [27] | Goldman L M;Atwater H A;Spaepen F.Mater Res Soc Symp Proc 160[A].Pittsburgh:PA,1990:577. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%