研究了硬质合金基体的预处理对金刚石沉积的影响，并确定了用MPCVD法在WC－Co刀具 上沉积金刚石薄膜的工艺参数。采用了一些提高成核密度和沉积速率的方法，用SEM、XRD和 Raman对金刚石薄膜的性质进行了分析。结果表明，合适的预处理可以有效的抑制钴的溢出并提 高薄膜的质量。
The effects of substrate pretreatment and processing parameters on the quality of diamond coating on WC－Co tools were reported. The diamond coatings were analyzed with scanning electron microscopy (SEM), X－ray diffraction (XRD) and laser Raman spectrometer (Raman). Efforts to improve the nucleation density and deposition speed were also undertaken. The results show that suita－ ble substrate pretreatment can effectively control the overflow of cobalt and improve the quality of coating.
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