与现有的金刚石膜抛光工艺相匹配的高效刻蚀技术，是目前研究的热点。自行研制的稀土 化合物浆料对CVD金刚石厚膜进行了刻蚀研究，刻蚀过程在低于金刚石氧化点的温度下和大气 环境中完成。其刻蚀结果，用扫描电子显微镜给出。实验表明,该工艺采用廉价的稀土化合物为 原料，具有简单、安全、高效的特点。
An effective etching technique is desirable for processing the rough CVD diamond thick films. In the paper, CVD diamond thick films were etched by rare－earth compound ink self－pre－ pared. The etching process was taken in the atmosphere at 600oC, a temperature below the oxidation temperature of diamond. A kind of inexpensive and safe rare－earth compound ink mainly made of Ce and La salts was used in this technique for the etching of CVD diamond film. The morphology of the samples was studied by SEM.The experimental results show that the process is simple and efficient for polishing the CVD diamond thick films rapidly.
参考文献
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