采用微波等离子体化学气相沉积（MPCVD）法成功地在多孔硅上沉积出均匀、致密的金刚 石膜。光致发光测量表明，金刚石膜可以有效稳定多孔硅的发光波长和发光强度，具有明显的钝 化效应。金刚石膜的这个特点再加上高硬度特性使金刚石膜成为多孔硅的一种潜在的钝化膜。
In this paper homogenous and dense diamond films with good crystalline quality were suc－ cessfully deposited on porous silicon(PS) surfaces by the microwave plasma assisted chemical vapor deposition(MPCVD) method.Photoluminescence measurements show that the CVD diamond film－ coated porous silicon has a weak shift of emission peak wavelength as compared with the stored porous silicon without a diamond film, and its PL peak intensity almost does not change with time. It means the diamond film can efficiently stabilize the porous silicon and provide a passivation effect. In addi－ tion,due to its well－known high hardness,the CVD diamond film can improve the mechanical strength of PS surface, therefore it is a promising candidate for passivation of porous silicon in the future.
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