以有机高分子化合物酒精和氢气为反应气体，用热丝CVD法在Al2O3陶瓷基片上沉积出 金刚石薄膜,用拉曼光谱，X射线衍射等方法进行了表征。探索了碳源浓度、热丝温度、基片温度 和预处理工艺对金刚石薄膜结构和性能的影响，并且得到了最佳的工艺条件。探讨了金刚石在 Al2O3衬底上的成核和生长机理。
Polycrystalline diamond films were deposited on the substrates of ceramic materials alumina by use of hot filament chemical vapor deposition (HFCVD)from a source of gas mixture of ethanol and hydrogen. The diamond films on the alumina substrates were observed by scanning electron microscopy (SEM) and optical microscopy (OM), and identified by low－angle diffraction analysis and Raman Spectroscopy. Structure and characters of diamond deposited by HFCVD can be influenced by the carbon concentration, tungsten temperature, substrate temperature and pretreatment technique. The best technology was obtained. The nucleation and growth mechanism of diamond films deposited on alumina has been discussed.
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