采用真空磁过滤弧沉积(FAD)的方法制备的类金刚石(DLC)薄膜具有良好的场发射性能.通过离子束技术和微细加工技术可以实现DLC薄膜的图形化并能大大提高薄膜的场发射性能.测试表明,DLC薄膜孔洞阵列具有很好的电子场发射性能,阈值电场达到了2.1V/μm,当场强为14.3V/μm时,电流密度达到了1.23mA/cm2.利用图形化的DLC薄膜作为阴极,设计和制作了矩阵选址单色场发射显示器(FED)样管.
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