运用磁控溅射技术在浸渍-提拉法制得的TiO2薄膜上溅射三氧化钨层得到光催化薄膜.采用SEM、XRD、AES、UV-vis漫反射光谱等方法表征催化剂薄膜的厚度、晶相结构、化学元素组成及光吸收性能.以甲基橙的光催化降解为反应模型,高压汞灯为光源,溅射有三氧化钨薄膜的哪光催化活性低于纯TiO2薄膜;滤过紫外光后,溅射有三氧化钨的薄膜光催化活性明显高于纯TiO2薄膜.本实验提供了一种制备高可见光活性的TiO2薄膜的方法.
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