利用射频磁控溅射方法在石英玻璃基片上制备了 WO3薄膜,测量了薄膜的伏安特性和显微 结构.实验表明实验制备了颗粒小于 100nm的 WO3多晶膜,薄膜具有良好的非线性电学行为,其 非线性系数在 0.1 ～ 1mA的范围内可达到 10以上.简略讨论了 WO3薄膜的非线性电输运机理.
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