利用离面双弯曲过滤阴极真空电弧沉积系统,在Φ 200 mm单晶硅片上制备四面体非晶碳薄 膜.利用 Dectek3型表面轮廓仪检验膜厚均匀性(小于 5%),并利用扫描电子显微镜( SEM)、原子力 显微镜( AFM)、激光拉曼光谱( Raman)、 X射线光电子谱( XPS)以及纳米压痕( Nano- Indenter)仪器 测试薄膜的性能和结构.结果表明:试验制备的薄膜是四面体非晶碳薄膜 , 其中 sp3键含量高达 80%以上, 薄膜表面纯净, 几乎没有大颗粒的污染, 表面粗糙度( Rq)小于 0.3 nm(取样面积 1μ m2), 薄膜硬度可达 50 GPa,杨氏弹性模量高于 550 GPa.
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