采用化学溶液法在Pt/Ti/SiO2/Si衬底上制备了PbZr0.4Ti0.6O3/LaNiO3(PZT/LNO)多层薄膜.X射线衍射测量表明LNO缓冲层的引入使PZT薄膜(111)择优取向度减小,(100)取向增加.原子力显微镜测量表明引入LNO缓冲层使得PZT薄膜表面更加平整、致密.在LNO缓冲层上制备的PZT薄膜具有优良的铁电特性和介电特性:LNO缓冲层厚度为40nm时,500 kV/cm的外加电场下,剩余极化(Pr)为37.6μC/cm2,矫顽电场(Ec)为65 kV/cm;100 kHz时,介电常数达到822,并且发现LNO缓冲层的厚度为40nm,PZT的铁电、介电特性改进最为显著.
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