研究了掺杂 CuO对 SnO2· Ni2O3· Ta2O5压敏材料电学性能的影响.实验发现,随着 CuO的 掺杂量从 0.50mol%增加到 1.50mol%,材料的压敏电场强度从 132V/mm升高到 234V/mm,相对 介电常数从 4663减小到 2701.电场强度变化的原因是 CuO掺杂引起的晶粒尺寸变化,随掺杂量 增加晶粒尺寸从 18.8μ m减小到 13.3μ m.未固溶于 SnO2晶格而偏析在晶界上的 CuO阻碍了相 邻 SnO2晶粒的融合 ,这导致了晶粒尺寸的减小.为了解释 SnO2· Ni2O3· Ta2O5· CuO电学非线性 性质的起源,本研究对前人的晶界缺陷势垒模型进行了修正.对该压敏材料进行了等效电路分析, 实验测量与等效电路分析结果相符.
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