研究了铜与硅之间W/Mo-N薄膜的扩散阻挡性能.在Si(100)基片上利用反应溅射沉积一层Mo-N薄膜,然后再利用直流溅射在Mo-N上面沉积Cu/W薄膜.样品在真空下退火,并利用四点探针、X射线衍射分析、扫描电镜分析、俄歇电子能谱原子深度剖析等测试方法研究了Cu/W/Mo-N/Si的热稳定性及W/Mo-N薄膜对铜与硅的扩散阻挡性能.实验分析表明,Cu/W/Mo-N/Si结构具有非常好的热稳定性,在600℃退火30min仍未发生相变,并能有效的阻挡铜与硅之间的扩散.
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