简单介绍了单层抗反膜的增透原理,并以Si片作为基片采用磁控溅射的方法制备了Al2O3、SiO2和ZrO2三种抗反膜.膜层的反射率测试结果表明:生长ZrO2膜后表面反射率下降可达30%;同时通过对GaInAsSb/GaSb PIN 红外探测器蒸镀抗反膜前后的器件的I-V特性及黑体探测率的测试表明:蒸镀ZrO2膜后GaInAsSb/GaSb PIN 红外探测器的黑体探测率平均提高了60.28%,远大于蒸镀Al2O3、SiO2后的48.91%和40.04%,说明ZrO2膜是一种较理想的单层抗反膜,使器件性能有所提高.
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