采用光刻胶SU-8的光刻成型技术和"多次光刻、一次显影"工艺制备了基于三层SU-8结构的微喷阵列芯片,重点研究了SU-8胶工艺过程中平整度、温度和曝光剂量对多层微结构的影响,解决了芯片结构有裂纹、发生破裂和喷孔堵塞等问题.利用O2等离子体处理了芯片微管道内表面,使液体样品在进样后能够进行自动传输、分配和贮存.持续10ms的10kPa气压驱动下,该芯片可以在3.4mm×3.4mm的尼龙膜上制成5×5样品微阵列,25个点直径平均值为384μm,变异系数为2.6%.利用该芯片制成的DNA微阵列的信号强度变异系数达到4.5%,直径大小变异系数达到3.2%,符合生物微阵列分析的要求.
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