在磁性纳米薄膜制备过程中,改变直流溅射的功率,制备一系列相同厚度的FeB磁性纳米膜.对纳米膜饱和磁化强度(4πMs)、矫顽力(Hc)、磁损耗μ"和铁磁共振线宽(△H)随功率的变化进行研究,发现随着溅射功率增加,Hc和△H呈现明显下降趋势,而4πMs和μ"增加.这是由于溅射功率的增加导致纳米膜内部α-Fe纳米晶相的形成,这同样被退火样品的铁磁共振曲线所证明.
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