以SmCl3·6H2O和Na2S2O3·5H2O为原料,采用电沉积法在单晶硅(100)和玻璃基板制备了SmS光学薄膜.采用XRD、AFM和紫外可见光分光光度计对薄膜进行了表征.研究了[Sm3+]/[S2O32-]、溶液的pH值对于薄膜的物相的影响.结果表明:在[Sm3+]/[S2O32-]=1:2,控制溶液pH值为4.50以及沉积1h的条件下,可制备出70nm厚单一晶相且表面比较平整的SmS薄膜,薄膜具有(331)方向的取向性.紫外光谱测试表明所制备的SmS薄膜具有290~300nm的紫外吸收特性,薄膜的禁带宽度约为3.6eV.
参考文献
[1] | Deen PP;Braithwaite D;Kernavanois N;Paolasini L;Raymond S;Barla A;Lapertot G;Sanchez JP .Structural and electronic transitions in the low-temperature, high-pressure phase of SmS[J].Physical review, B. Condensed matter and materials physics,2005(24):5118-1-5118-5-0. |
[2] | Photoinduced phase transition of metallic SmS thin films by a femtosecond laser[J].Applied physics letters,2003(21):3641-3643. |
[3] | Petrov M P .Holographics Storage in SmS Thin Films[J].Optics Communications,1977,22(03):293-296. |
[4] | 黄剑锋,曹丽云.双靶溅射法制作SmS光学薄膜[J].稀有金属材料与工程,2004(03):333-336. |
[5] | Hickey C F;Gibson U J .Optical response of switching SmS in thin films prepared by reactive evaporation[J].Journalof applied physics,1987,62(09):3912-3916. |
[6] | Miodushevsky P.;De Tomasi F.;Perrone MR.;Tundo S. Vasanelli L.;Protopapa ML. .Fine trimming of SmS film resistance by XeCl laser ablation[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2000(2):251-254. |
[7] | Volodin N M;Zavyalova L V;Kirillov A I .Investigation of growth conditions,crystalstructure and surface morphology of SmS films fabricated by MOCVD technique[J].Kvantova ta Optoelektronika,1999,2(02):78-83. |
[8] | 杜金会,于振瑞,王旭艳,张加友,贾小东,郭淑华.电沉积法制备CoS薄膜[J].光电子·激光,2002(12):1215-1218. |
[9] | Naoya Sato;Masaya Ichimura;Eisuke Arai.Characterization of Electrical Properties of SnS Thin Films Prepared by the Electrochemical Deposition Method[A].Osaka,Japan,2003 |
[10] | 黄剑锋,曹丽云.双靶溅射法制备M-SmS光学薄膜的研究[J].材料科学与工艺,2004(01):1-3. |
[11] | 薛建强,龚跃球,刘孝明,徐慢.旋转涂覆法制备硫化砷玻璃薄膜及其光学性质的研究[J].玻璃与搪瓷,2003(05):18-21. |
[12] | Pankove J I;Holonyak N Jr.Optical Processes in Semiconductors Solid State Physical Electronic Series[M].Englewood Cliffs,NJ:Prentice-Hall Press,1971:34. |
[13] | Tanemura S.;Koide S.;Senzaki Y.;Miao L.;Hirai H.;Mori Y.;Jin P. Kaneko K.;Terai A.;Nabatova-Gabain N. .Fabrication and characterization of metal and semiconductor SmS thin films by rf/dc dual magnetron sputtering[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2003(0):279-286. |
[14] | Lashkarev G V;Ivanchenko L A .[J].JOURNAL OF NON-CRYSTALLINE SOLIDS,1970,8-10:670. |
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