采用磁控溅射法在自然氧化的单晶Si(100)基底上制备了(FePt/Ag)10多层薄膜,并在10kA/m磁场中进行了不同温度的真空热处理,研究了磁场作用下,不同热处理温度对FePt薄膜有序化转变及磁性能的影响.X射线衍射研究表明,在磁场作用下通过多层膜设计可以比较容易获得垂直生长的易磁化轴;选择适当的热处理温度、降低多层膜中每层膜厚可以制备出晶粒尺寸细小均匀的FePt/Ag垂直磁化薄膜,适用于高密度垂直磁记录介质材料.
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