采用射频磁控溅射法在Si(100)衬底上制备了LaNiO3薄膜.通过原位加热或后续热处理使薄膜晶化.借助X-ray衍射分析、电感耦合等离子体发射光谱、原子力显微镜等手段研究了溅射工艺对薄膜显微结构的影响.实验结果表明,溅射时是否加热对薄膜的结晶取向影响很大,而氧分压则影响La/Ni比.衬底不加热时,通过后续热处理得到多晶的随机取向薄膜,而当溅射时原位加热300℃,则得到有明显(100)择优取向的薄膜.
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