以钨粉和双氧水为主要原料,采用溶胶 - 凝胶法制备了WO3纳米薄膜,并用磁控溅射法在该WO3薄膜表面溅射掺杂了催化剂Pt.研究了该Pt/WO3纳米薄膜的结构和氢敏性能,结果表明,用此种方法制备的WO3基掺Pt薄膜具有良好的氢敏特性;平均膜厚160nm;薄膜经400℃以下退火处理后是非晶态结构,表面疏松多孔,氢敏效果好;经400℃以上退火处理后呈晶态结构,表面粗糙致密,氢敏效果差;Pt掺杂量对薄膜的氢敏效果有影响,掺杂量越多,氢敏效果越差.
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