对柠檬酸系、盐酸系溶液腐蚀GaAs/InGaP异质结构材料体系时出现的腐蚀不均匀现象进行了实验研究,采用原子力显微镜(AFM)、电子显微镜、台阶仪等分析了不同腐蚀条件下GaAs/InGaP异质界面的腐蚀形貌,找到了简单有效的办法,可获得很好的表面平整度,同时侧向腐蚀也较小.
参考文献
[1] | J. A. Diniz;J. W. Swart;K. B. Jung;J. Hong;S. J. Pearton .Inductively coupled plasma etching of in-based compound semiconductors[J].Solid-State Electronics,1998(11):1947-1951. |
[2] | Yoon SF.;Zheng HQ.;Ng TK. .Low damage and low surface roughness GaInP etching in Cl-2/Ar electron cyclotron resonance process[J].Journal of Vacuum Science & Technology, B. Microelectronics and Nanometer Structures: Processing, Measurement and Phenomena,2001(5):1775-1781. |
[3] | Hanson A W;Danzilio D;Bacher,K A.Selective gate recess process utilizing MBE -grown In0.5Ga0.5 P etchstop layers for GaAs-based FET technologies[A].,1998:195-197. |
[4] | Hiroyuki Uchiyama;Hiroshi Ohta;Takashi Shiota;Chisaki Takubo;Kenichi Tanaka;Kazuhiro Mochizuki .Fabrication of sub-transistor via holes for small and efficient power amplifiers using highly selective GaAs/InGaP wet etching[J].Journal of Vacuum Science & Technology, B. Microelectronics and Nanometer Structures: Processing, Measurement and Phenomena,2006(2):664-668. |
[5] | 石瑞英,孙海锋,刘训春,刘洪民.100mm InGaP/GaAs HBT及相关电路关键工艺[J].半导体学报,2005(01):106-110. |
[6] | LI Xiao-Bai .The Selective Etching Technology in GaAs-Based and InP-Based HFET[J].Semiconductor International,2000,37(04):5-13. |
[7] | LIU Hong-Gang .Study on 10Gb/s Optic Modulator InGaP/GaAs HBT Driver IC--Modeling of HBT,MMIC Design and Fabrication[D].,2003. |
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