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通过改变SU-8光刻胶中PAG浓度获得含不同PAG浓度的各种改性SU-8光刻胶,在对其光学性能以及最小曝光剂量的测定基础上研究改性SU-8光刻胶的光刻工艺,借助于改性SU-8光刻胶的合理设计以及背面曝光和正面曝光的结合应用提高多元材料复杂结构的集成制造能力.

参考文献

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[5] 朱军,刘景全,张金娅,陈迪,石磊.环氧基紫外负性光刻胶的特性、应用工艺与展望[J].高分子材料科学与工程,2004(04):59-61,65.
[6] Kim SJ;Yang H;Kim K;Lim YT;Pyo HB .Study of SU-8 to make a Ni master-mold: Adhesion, sidewall profile, and removal[J].Electrophoresis: The Official Journal of the International Electrophoresis Society,2006(16):3284-3296.
[7] Zhong-geng Ling;Kun Lian .Characterization and application of PAG diluted SU8[J].International Journal of Computational Engineering Science,2003,4(03):529-532.
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