本文研究了自分离硅微通道(self lift-off silicon microchannels)的氧化问题.自分离是在特定的实验条件下,在完成电化学刻蚀后,硅微通道可以自动和衬底分离的一种新技术.研究发现,在使用传统的干氧-湿氧-干氧氧化化过程中,硅微通道出现了弯曲变形的现象.微通道越薄,其形变越大.通过使用较厚的硅微通道以及在干-湿-干氧化过程之前增加了干氧,以及先进行激光切割的步骤,改善和基本消除了弯曲变形的现象.
The oxidation of the self lift-off silicon microchannels is studied. Self lift-off silicon micro-channels are fabricated by a new technology; under certain experimental conditions, the silicon micro-channels can lift off from the substrate automatically after electrochemical etching. In the process of the traditional dry-wet-dry oxidation, damages and distortion of the silicon microchannels occurred. It was found that the thinner the silicon microchannels, the more serious the distortion and damages are. By u-sing thicker silicon microchannels and adding a procedure of dry oxidation before the dry-wet-dry oxi-dation, the damages and distortion of the silicon microchannels can be eliminated.
参考文献
| [1] | Beetz CP.;Steinbeck J.;Lemieux B.;Winn DR.;Boerstler R. .Silicon-micromachined microchannel plates[J].Nuclear Instruments and Methods in Physics Research, Section A. Accelerators, Spectrometers, Detectors and Associated Equipment,2000(1/3):443-451. |
| [2] | Xiaoming Chen;Lin Jilei;Shaohui Xu.Oxidation of High Area Ratio Silicon Microchannels Fabricated by Elec-trochemical Etching[A].,2008:78-81. |
| [3] | Lin Jilei;Xiaoming Chen;Shaohui Xu.Investigation of the Formation of undercut during the Fabrication Silicon Microchannel by Electrochemical Etching[A].Sanya,China:IEEE -NEMS,2008:74-77. |
| [4] | M. Uematsu;H. Kageshima;K. Shiraishi;M. Nagase;S. Horiguchi;Y. Takahashi .Two-dimensional simulation of pattern-dependent oxidation of silicon nanostructures on silicon-on-insulator substrates[J].Solid-State Electronics,2004(issue 6):1073-1078. |
| [5] | Hsun-Feng Hsu;Chien-Wei Lee .Effects of humidity on nano-oxidation of silicon nitride thin film[J].Ultramicroscopy,2008(10):1076-1080. |
| [6] | Koh A.;Wright C.;Wilks SP.;Mawby PA.;Bowen WR.;Kestle A. .Comparative surface studies on wet and dry sacrificial thermal oxidation on silicon carbide[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2001(3/4):210-216. |
| [7] | Price G J;Brunton A N;Beijersbergen M W et al.X-ray focusing with Woher microchannel plate optics[J].Nuclear Instruments and Methods in Physics Research,2002,A 490:276-289. |
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