采用超高真空分子束外延-扫描隧道显微镜(UHVMBE-STM)系统研究了不同温度下锰及其硅化物在Si(100)-2 ×1重构表面上的外延生长情况.实验结果表明当生长过程中衬底温度控制在室温到135℃时,生成大小基本一致的锰纳米团簇;当衬底温度达到210℃时锰与硅开始发生反应,形成硅化物,并有纳米线结构出现;当衬底温度达到330℃时,纳米线完全被棒状物或不规则的三维岛状硅化物取代.随着沉积时衬底温度升高,生成物的成核密度与生长温度的关系与经典的二维岛成核理论相符合.
Epitaxial growth of manganese and manganese silieide on Si(100)-2×1 reconstructed surface at different temperatures was studied using ultra high vacuum molecular beam epitaxial-scanning turme ling microscopy system(UHVMBE-STM).The results showed that when the temperature of substrate was controlled from room temperature(RT)to 135~C in the growing progress,the products were manganese nanoclusters which were almost in the sanle size;when the substrate temperature Was elevated to 210℃,manganese began to react with Si,and there were manganese silicide nanowires on the substrate;when it was up to 330℃,the nanowires on the substrate were totally replaced by stick-like manganese silicide and three-dimensional(3 D)irregularly-shaped sihcide islands.Along with the deposited temperature increasing,the relationship between the nucleation density of the products and the deposition temperature was well in accorded with that the classical nucleation theory of the two-dimensional(2D)island growth.
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