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本文用辐射加固和未加固的SIMOX(注氧隔离)SOI(绝缘体上硅)材料制作了Pseudo-MOS晶体管和nMOS晶体管,并进行了X射线总剂量辐射实验.结果表明加固工艺能有效提高SIMOX SOI材料的抗总剂量辐射能力,同时也表明Pseudo-MOS晶体管能有效的替代nMOS晶体管对SOI材料的抗总剂量辐射能力进行评估.

参考文献

[1] Auberton-Herve A J.SOI:Materials to Systems[M].CA:IEEE IEDM technical digest,1996:3-10.
[2] Mrstik B.J.;Hughes H.L.;Gouker P.;Lawrence R.K.;McMarr P.J. .The role of nanoclusters in reducing hole trapping in ion implanted oxides[J].IEEE Transactions on Nuclear Science,2003(6):1947-1953.
[3] Sorin Cristoloveanu;Daniela Munteanu;Michael S. T. Liu .A review of the pseudo-MOS transistor in SOI wafers: operation, parameter extraction, and applications[J].IEEE Transactions on Electron Devices,2000(5):1018-1027.
[4] Nasser Hefyene;Sorin Cristoloveanu;Gerard Ghibaudo;Pierre Gentil;Yoshitaka Moriyasu;Takashi Morishita;Masahiro Matsui;Akitaka Yasujima .Adaptation of the pseudo-MOS transistor for the characterization of silicon-on-sapphire films[J].Solid-State Electronics,2000(10):1711-1715.
[5] Jun B.;Fleetwood D.M.;Schrimpf R.D.;Zhou X.;Montes E.J.;Cristoloveanu S. .Charge separation techniques for irradiated pseudo-MOS SOI transistors[J].IEEE Transactions on Nuclear Science,2003(6):1891-1895.
[6] Kenji Komiya;Nicolas Bresson;Shingo Sato;Sorin Cristoloveanu;Yasuhisa Omura .Detailed Investigation of Geometrical Factor for Pseudo-MOS Transistor Technique[J].IEEE Transactions on Electron Devices,2005(3):406-412.
[7] Fleetwood D.M.;Tsao S.S. .Total-dose hardness assurance issues for SOI MOSFETs[J].IEEE Transactions on Nuclear Science,1988(6):1361-1367.
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