采用PECVD工艺在普通玻璃衬底上制备非晶硅薄膜,用波长为532nm的倍频Nd:YAG激光对非晶硅薄膜的表层进行了晶化.研究了激光能量密度对非晶硅薄膜表面结晶度以及晶粒大小的影响,并对晶化后的非晶硅表面形貌进行了表征.研究结果表明:该非晶硅薄膜晶化的阈值能量密度为800 mJ/cm2,当激光能量密度大于该值时,晶化效果反而变差.同时经过拉曼光谱表征,经由高斯拟合和数值计算得出薄膜结晶度在45%~60%之间,平均晶粒尺寸在30~50nm.
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