本文采用HWA-MWECR - CVD系统制备了微晶硅薄膜.研究了氢稀释比、反应压强以及微波功率对微晶硅薄膜非晶转微晶相变及其相关性能的影响.实验结果表明:当氢稀释比为94％、反应压强为1.5Pa以及微波功率为500W时,高质量的微晶硅薄膜可以被获得,如2.86* 104的高光敏性,1nm左右的沉积速率以及8.9％的光致衰退速率等.
Using HWA-MWECR-CVD system μc -Si:H thin films were prepared.The influences of hydrogen dilution ratio,reaction pressure and microwave power on the amorphous to microcrystalline phase transition,deposition rate and photo - electronic properties of thin films were studied.The experimental results showed that under the conditions of 94％ hydrogen dilution ratio,1.Spa reaction pressure and 500W microwave power,high -quality μc -Si:H thin films were obtained,such as high photosensitivity of 2.86 * 104,high deposition rate of about 1 nm/s and low light - induced degradation rate of 8.9％,etc.
参考文献
| [1] | M.Suzuki;I.Hide;T.Yokoyama et al.Growth of polycrystalline silicon sheet by Hoxan cast ribbon process[J].Journal of Crystal Growth,1990,104(01):102-107. |
| [2] | S.S.He;M.J.Williams;D.J.Stephens et al.Fabrication and performance of thin film transistors,TFTs,incorporating doped μc-Si source and drain contacts,and boron compensated μc-Si channel layers[J].Journal of Non-Crystalline Solids,1993,164-166(52):731-734. |
| [3] | Pisarkiewicz T;Stapinski T .Influence of thickness inhomogeneity on the determination of optical constants of amorphous silicon thin films[J].Applied Surface Science,1993,65-66(02):511-514. |
| [4] | F.Demichelis;G.Kaniadakis .Structural evolution in α-SiC:H induced by thermal annealing as deduced by optical properties[J].Physical Review B:Condensed Matter,1992,179(01):59-64. |
| [5] | I.Solomon;B.Drévillon;H.Shirai et al.Plasma deposition of microcrystalline silicon:the selective etching mode 1[J].Journal of Non-Crystalline Solids,1993,164-166(02):989-992. |
| [6] | Martins R;Willeke G;Fortunato E et al.Transport in μc-Six:Cy:Oz:H films prepared by a TCDDC system[J].Journal of Non-Crystalline Solids,1989,114:486-488. |
| [7] | Zhu XH;Chen GH;Ding Y;Ma ZJ;Liu GH;Zhang WL;He B;Gao ZH;Li ZZ .Influence of hot wire on the formation of micro crystalline silicon in MWECR-CVD system[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2006(5):421-425. |
| [8] | Zhu XH;Chen GH;Zheng MS .Study on an improved MWECR CVD system and preparation of silicon-substrate thin films[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2008(10):1183-1187. |
| [9] | Mott NF;Davis EA.Electronic Processes in Non-Crystalline Materials[M].Oxford:Oxford University Press,1979:287. |
| [10] | S.Vepek;F.-A.Sarott;S.Rambert .lon impact induced desorption study of the surface of plasma-deposited nanocrystalline silicon[J].Surface Science,1987,189-190:3967-3971. |
| [11] | A.H.Mahan;P.Raboisson;D.L.Williamson .Evidence for microstructure in glow discharge hydrogenated amorphous Si-C alloys[J].Solar Cells,1987,21(1-4):117-126. |
| [12] | A.H.Mahan;J.Carapella;R.S.Crandall .Deposition of Device Quality,Low H Content Amorphous Silicon[J].Journal of Applied Physics,1991,69:6728-6732. |
| [13] | A.tsuda .Improved Stability of a-Si:H Fabricated From SiH2Cl2 by ECR Hydrogen Plasma[J].Journal of Vacuum Science and Technology A:Vacuum Surfaces and Films,1998,16:365-367. |
| [14] | S.Kleinm .Microcrystalline Silicon Prepared by HotWire Chemical Vapour Deposition for Thin Film Solar Cell Applications[J].Japanese Journal of Applied Physics,2002,41:10-14. |
| [15] | S.Veprek;F.A.Sarott .Effect of Grain Boundaries on the Raman Spectra,Optical Absorption,and Elastic Light Scattering in Nanometer-Sized Crystalline Silicon[J].Physical Review B,1987,36:3344-3350. |
| [16] | Vetterl O.;Finger F.;Houben L.;Luysberg M.;Wagner H.;Hapke P. .Growth of microcrystalline silicon using the layer-by-layer technique at various plasma excitation frequencies[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,1998(Pt.B):866-870. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%