采用共沉淀方法,以金属Ga和Gd2O3为起始原料,以氨水为沉淀剂,制备了GGG多晶.测量了共沉淀方法制备的GGG多晶、固相反应法制备的Nd:GGG多晶以及提拉法生长的GGG、Nd:GGG晶体的X射线衍射谱(XRD),利用图解外推法计算了晶格参数.共沉淀方法制备的GGG多晶原料较固相法制备的Nd:GGG晶格参数小,可能是固相制备过程中Ga组分挥发导致Gd3+取代了Ga3+位以及Nd3+占据了部分的Gd3+位,从而使晶格参数变大.同时就提拉法生长的Nd:GGG晶体和GGG晶体的晶格参数进行比较发现,Nd:GGG晶体的晶格参数较纯GGG晶体的晶格参数大,说明在Nd:GGG晶体中Nd3+占据了部分的Gda+位.另外,晶体的晶格参数较多晶粉末的晶格参数大,分析认为这可能也是由于Ga组分的挥发导致Gd3+占据了Ga3+位所引起.这些实验结果说明Ga组分挥发在原料制备过程和晶体生长过程中都可能存在,因此应在制备原料和晶体生长等各个环节中考虑Ga组分的挥发.采用液相共沉淀方法制备有利于抑止Ga组分的挥发.
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