介绍了激光诱导化学气相沉积法制备纳米氮化硅的工艺原理,通过增加正交紫外光束激励NH3分解,提高气相中n(N)/n(Si)比,从而减少产物中游离硅的浓度,制备出粒径7～15 nm的无团聚、理想化学剂量(n(N)/n(Si)=1.314)的非晶纳米氮化硅粉体.采用透射电子显微镜观察粉体形貌,并指出表面效应和量子尺寸效应导致粉体红外吸收光谱和拉曼光谱的"蓝移"和"宽化"现象.采用双光束激励的光诱导化学气相沉积法是制备高纯度纳米氮化硅粉体的理想方法.
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