在常温下,用射频磁控溅射在石英衬底上沉积厚度约为200 nm的TiO2薄膜,使用波长为248 nm的KrF脉冲激光器,在不同功率密度下对薄膜样品进行辐照退火处理,并采用X射线衍射(XRD)、拉曼(Raman)、X射线电子能谱(XPS)、原子力显微镜(AFM)、扫描电子显微镜(SEM)、高分辨率扫描隧道显微镜(HRTEM)以及选择区域电子衍射(SAED)、紫外可见分光光度计等方法分析不同激光功率密度退火对TiO2薄膜的结构、表面形貌和透射率等性能的影响.结果表明当激光功率密度为0.5 J/cm2时,可获得高质量的锐钛矿TiO2薄膜,当继续增大光功率密度时,TiO2薄膜变为(1 1 0)取向的金红石相,其薄膜表面粗糙度也相应增大.
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