在较低的模板剂浓度下,采用二次生长法在大孔(孔径约4~6μm)α-Al2O3载体上合成Silicalite-1沸石膜,并采用x射线衍射法、扫描电子显微镜及不同温度下单组分气体渗透实验对所合成的沸石膜进行表征.结果表明,合成的是典型的Slicalite-1沸石膜,无其他杂质形成;制备的沸石膜连续、互生、致密,没有明显的缺陷.在40℃下H2的渗透速率为4.47×10-7 mol/(m2·s·Pa),H2/SF6的理想分离系数44,远高于其KnudSen扩散系数8.54.在40~200℃之间,H2/SF6的理想分离系数曲线呈V型,H2的渗透速率几乎不变,N2的渗透速率随温度升高略下降.
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