研究了以羰基镍为沉积源,利用MOCVD技术沉积镍薄膜;讨论了沉积温度及压力对沉积速率的影响,以及利用SEM、XRD、DSC等分析手段来探讨沉积温度及不同沉积基体对薄膜微观形态的影响.结果表明,沉积温度约为150℃可以得到较快的沉积速率,而且薄膜连续具有金属光泽;以铜为沉积基体所得到的薄膜其微观形态中有明显的晶粒,以玻璃为基体得到的薄膜却含有部分非晶态的组织;沉积速率随着反应室工作压力的增加而下降.
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