氮氧化硅薄膜综合了SiO2膜和Si3N4膜的优点,具有优秀的光电性能,力学性能和稳定性能,已经在光电领域获得了广泛地应用,此外在材料改性方面也有广阔的应用前景.本文综合评述了几种氮氧化硅薄膜的制备方法,比较了各自的优缺点,并指出了今后制备方法的发展趋势.
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