改变CHF3/CH4流量比R=[CHF3]/([CHF3]+[CH4]),采用微波电子回旋共振等离子体化学气相沉积(MWECR-CVD)方法沉积a-C:F:H薄膜.a-C:F:H薄膜的结构和光学带隙使用傅立叶变换红外光谱和紫外-可见光谱来表征.红外结果表明,在低流量比R(R<64%)下,薄膜的红外特征结构主要以-CF(1060cm-1),-CF2(1120cm-1)以及-CHx(2800～3000cm-1)的伸缩振动为主;在高流量比R(R＞64%)下,薄膜表现为类聚四氟乙烯(PTFE)的结构特征,典型的红外特征峰是位于1220cm-1处的-CF2反对称伸缩振动.薄膜的光学带隙Eg随流量比R的变化表现为先降后升.进一步研究表明,薄膜中的H和F浓度调制着薄膜的 C==C共轭双键结构,使光学带隙Eg从2.37到3.3之间变化.
参考文献
| [1] | K Endo;T Tatsumi .[J].Journal of Applied Physics,1995,78:1370. |
| [2] | H Yokomichi;T Hayashi;T Amano;A.Masuda .[J].Journal of Non-Crystalline Solids,1998,227-230:641. |
| [3] | L. G. Jacobsohn;D. F. Franceschini;M. E. H. Maia da Costa;F. L. Freire Jr. .Structural and mechanical characterization of fluorinated amorphous-carbon films deposited by plasma decomposition of CF{sub}4-CH{sub}4 gas mixtures[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2000(5):2230-2238. |
| [4] | H Yang;D J Tweet;Y Ma;T.Nguyen .[J].Applied Physics Letters,1998,73:1514. |
| [5] | Y Ma H Yang;J Guo;C Sathe;A Agui,J Nordgren .[J].Applied Physics Letters,1998,72:3353. |
| [6] | K Endo;K Shinoda;T Tatsumi .[J].Journal of Applied Physics,1999,86(05):2739. |
| [7] | M Walker;K |M Baumgartuer;M Kaiser;S.Lindenmaier,E.Rauchle .[J].Surface and Coatings Technology,1997,97:291. |
| [8] | J W Yi;Y H Lee;B Farouk .[J].Thin Solid Films,2000,374:103. |
| [9] | H Yokomichi;T Hayashi;A Masuda .[J].Applied Physics Letters,1998,72:2704. |
| [10] | K Endo;T Tatsumi.[J].Japanese Journal of Applied Physics,1997:36,L1531. |
| [11] | R P Mota;T Shiosawa;S F Durrant;M A B Moraes .[J].Journal of Vacuum Science and Technology,1995,A13(06):2747. |
| [12] | K M Krishna;H Ebisu;K Hagimoto et al.[J].Applied Physics Letters,2000,78:294. |
| [13] | Z J Zhang;K Norumi;H Naramoto;Z.P.Wu,S.Yamomoto,A.Miyashita,M.Tamada .[J].Journal of Applied Physics,1999,86:1317. |
| [14] | L H Chou;H W Wang .[J].Journal of Applied Physics,1993,74:4673. |
| [15] | S.F. YOON;H. YANG;RUSLI .The Influence of rf Induced Bias on the Properties of Diamond-Like Carbon Films Prepared Using ECR-CVD[J].Journal of Electronic Materials,1998(1/6):44-50. |
| [16] | N. Takada;K. Shibagaki;K. Sasaki;K. Kadota;K.-I. Oyama .Analysis of the molecular structure of fluorocarbon deposits produced by C{sub}4F{sub}8 and C{sun}4F{sub}8 - H{sub}2 plasmas[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2001(2):689-692. |
| [17] | S J Limb;K K Gleason;D J Edell;E F Gleason .[J].Journal of Vacuum Science and Technology A-Vacuum Surfaces and Films,1997,A.15:1814. |
| [18] | R E Sah;B Dischler;A Bubenzer;P Loidl .[J].Applied Physics Letters,1985,46:739. |
| [19] | S J Limb;C B Labelle;K K Gleason;D.J.Edell,E.F.Gleason .[J].Applied Physics Letters,1996,68(20):2810. |
| [20] | W A Landford;M J Rand .[J].Journal of Applied Physics,1988,49:2473. |
| [21] | R d′ Agostino;F Gramarossa;V Colaprico;R d′Ettole .[J].Journal of Applied Physics,1983,54(03):1284. |
| [22] | J Tauc;R Grigorovici;A ranus .[J].Physica Status Solidi,1966,15:627. |
| [23] | A Grill;V Patel .[J].Applied Physics Letters,1992,60(17):2089. |
| [24] | T S Moravec;J C Lee .[J].Journal of Vacuum Science and Technology,1982,20:338. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%