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  4. 低温PVD法制备多组分超硬薄膜研究

材料科学与工程学报, 2003, 21(1): 110-116. doi: 10.3969/j.issn.1673-2812.2003.01.029

低温PVD法制备多组分超硬薄膜研究

彭志坚 1, , 齐龙浩 2, , 刘大鹏 3, , 李文治 4, , 苗赫濯 5,

1.清华大学新型陶瓷与精细工艺国家重点实验室,北京,100084

2.清华大学新型陶瓷与精细工艺国家重点实验室,北京,100084

3.清华大学新型陶瓷与精细工艺国家重点实验室,北京,100084

4.清华大学新型陶瓷与精细工艺国家重点实验室,北京,100084

5.清华大学新型陶瓷与精细工艺国家重点实验室,北京,100084

关键词： 多组分薄膜 , 硬质薄膜 , 低温 PVD法

Study on the Preparation of Multicomponent Superhard Filmswith PVD Method at Low Temperature

对薄膜淀积的各种PVD技术和新型薄膜研究进展进行了综述,讨论了多组分硬质薄膜低温制备存在的问题,指出了解决的办法;归纳了影响多组分硬质薄膜在三维基体上均匀、均质淀积的因素,重点讨论了基体旋转与靶源配置问题;指出了用低温PVD法淀积多组分超硬薄膜研究方向.

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