低介电常数多孔二氧化硅薄膜的制备与研究

材料科学与工程学报, 2005, 23(3): 408-411. doi: 10.3969/j.issn.1673-2812.2005.03.024

低介电常数多孔二氧化硅薄膜的制备与研究

吴兆丰 ^1, , 吴广明 ^2, , 姚兰芳 ^3, , 沈军 ^4, , 刘枫 ^5,

1.同济大学,波耳物理研究所,上海,200092;盐城工学院,基础部,江苏,盐城,224003

2.同济大学,波耳物理研究所,上海,200092

3.同济大学,波耳物理研究所,上海,200092

4.同济大学,波耳物理研究所,上海,200092

5.同济大学,波耳物理研究所,上海,200092

基金项目: 教育部跨世纪优秀人才培养计划上海市科委国际合作项目(02SL001) 上海市学科建设项目国家自然科学基金(20133040) 上海市自然科学基金(02ZE14101) 教育部军品配套项目国家高技术研究发展计划(863计划)(2002AA842052)

关键词：溶胶-凝胶技术 , 介电常数 , 多孔氧化硅 , 薄膜

Preparation and Study of Low Dielectric Constant Mesoporous Silica Films

本文报道了一种新型纳米多孔低介电常数薄膜的制备方法.以十六烷基三甲基溴化铵(CTAB)为模板剂,正硅酸乙酯为硅源,盐酸为催化剂,采用溶胶-凝胶技术,通过提拉法制备了二氧化硅透明介孔薄膜.用红外光谱、小角XRD、原子力显微镜对样品进行了表征,并采用椭偏仪和阻抗分析仪测量薄膜的折射率和介电常数.通过调节表面活性剂浓度和老化时间等实验条件制备出了K＜2.5、机械强度好的低介电常数薄膜.

参考文献

[1]	Lee W W;Ho P S .Low-Dielectric-Constant Materials for ULSI Interlayer-Dielectric Applications[J].MRS Bulletin,1997,22:19-23.
[2]	Bhan MK.;Cheung D.;Huang J. .DEPOSITION OF STABLE, LOW KAPPA AND HIGH DEPOSITION RATE SIF4-DOPED TEOS FLUORINATED SILICON DIOXIDE (SIOF) FILMS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(0):507-511.
[3]	Kazuhiko Endo;Toru Tatsumi .Plasma fluorination of polyimide thin films[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,1997(6):3134-3137.
[4]	Lu T M;Moore J A .Vapor Deposition of Low-Dielectric-Constant Polymeric Thin Films[J].MRS Bulletin,1997,22:28-31.
[5]	Homma T .Low dielectric constant materials and methods for interlayer dielectric films in ultralarge-scale integrated circuit multilevel interconnections[J].Materials Science and Engineering,1998,23(06):243-285.
[6]	吴广明,沈军,王珏,周斌,倪星元.溶胶凝胶制备纳米多孔SiO2光学增透薄膜耐磨特性强化研究[J].原子能科学技术,2002(04):374-379.
[7]	STUPP S. I.;LEBONHEUR V.;WALKER K.;LI L. S.;HUGGINS K. E.;KESER M.;AMSTUTZ A. .SUPRAMOLECULAR MATERIALS - SELF-ORGANIZED NANOSTRUCTURES[J].Science,1997(5311):384-389.
[8]	Floch HG;Belleville PF.A Scratch-resistant Single-layer Antireflective Coating by a low Temperature Sol-gel Route[A].,1992:135-149.
[9]	Kresge C T;Leonowicz M E;Roth W J et al.Ordered mesoporous molecular sieves synthesized by a liquid-crystal template mechanism[J].Nature,1992,359:710-712.
[10]	Dhaval A Doshi;Nicola K Huesing;Mengcheng Lu et al.Optically Defined Multifunctional Patterning of Phtosensitive Thin-Film Silica Mesophases[J].Science,2000,290:107-111.
[11]	Makoto Ogawa;Naoshi Masukawa .Preparation of transparent thin films of lamellar, hexagonal and cubic silica-surfactant mesostructured materials by rapid solvent evaporation methods[J].Microporous and Mesoporous Materials,2000(1):35-41.

上一张下一张

计量

下载量()
访问量()

作者相关

文章评分

您的评分：
1

0%
2

0%
3

0%
4

0%
5

0%

材料期刊网

低介电常数多孔二氧化硅薄膜的制备与研究

Preparation and Study of Low Dielectric Constant Mesoporous Silica Films

参考文献