采用直流反应磁控溅射工艺,在载波片和Al基材上制备出金黄色的(Ti,Zr)N薄膜.(Ti,Zr)N薄膜具有比TiN薄膜更高的硬度和更强的耐腐蚀性能.用XRD衍射方法和扫描隧道显微镜对薄膜的晶体结构、微观表面形貌和电子结构进行了测试分析.XRD结果表明,(Ti,Zr)N薄膜为多晶态,存在TiN和ZrN两种分离相;从表面形貌可知,薄膜表面平整,晶粒排列致密且无连接松散的大颗粒;STS谱表明,Zr掺杂后,禁带宽度仍为1.64eV,但在禁带内增加了新能级,新能级的宽度分别为0.33eV和0.42eV,这也正是掺杂Zr后,薄膜仍呈现金黄色的主要原因.
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