以CF4、CH4和N2的混合气体为源气体,利用rf-PECVD沉积技术制备了氮掺杂氟化非晶碳(a_C:F:N)薄膜,研究了源气体流量比对a_C:F:N薄膜沉积速率和结构的影响.用椭圆偏振光谱测试仪测量了薄膜厚度,结合沉积时间计算了薄膜的沉积速率(在18～21nm/min之间),随流量比增大,薄膜的沉积速率先升高后降低.FTIR光谱分析表明,随流量比增大,薄膜中含F量降低,交联结构增强.Raman光谱分析发现,薄膜中的碳原子由sp2和sp3两种组态的混合结构组成,并进一步证明,随流量比增大,薄膜中sp2键含量增加,交联程度增强.
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