在不同氧氩比例气氛下,采用反应直流磁控溅射方法制备了SiO2薄膜.利用X射线衍射(XRD)、X射线光电子能谱(XPS)、原子力显微镜(AFM)和紫外可见光谱(UV-Visible spectrum)等研究了氧氩比例的不同对SiO2薄膜的晶体结构、化学配比、表面形貌和光学性能的影响.结果显示:室温下,不同氧氩比例的SiO2薄膜都为非晶结构;随着氧分量的增加,Si2p与O1s向高结合能方向移动;在氧分量较大的气氛下,SiO2薄膜的化学失配度较小,薄膜均匀,致密,在400-1100nm有良好的光透过性.
参考文献
| [1] | 周业为,谢建,李育德,曾传相,邱服民.HfO2,SiO2单层光学薄膜激光预处理机理研究[J].四川大学学报（自然科学版）,1999(06):1144. |
| [2] | Kumagai A;Ishibashi K;Ge Xu M;Tanaka H.Nogami O.Okada .HIgh-quality SiO2 film deposition using active reaction by oxygen radical[J].Vacuum,2002,66:317-322. |
| [3] | Chrysicopoulou P.;Davazoglou D.;Trapalis C.;Kordas G. .Optical properties of SiO2-TiO2 sol-gel thin films[J].Journal of Materials Science,2004(8):2835-2839. |
| [4] | Danson N;Hall G W;Howson R P .Improved control techniques for the reactive magnetron sputtering of silicon to produce silicon oxide and the implications for selected film properties[J].Thin Solid Films,1996,289:99-106. |
| [5] | ZywitzkiU O;Sahm H;Krug M;Morgner H,Neumaon M .Comparison of structure and properties of SiOx coatings deposited by reactive pulsed magnetron sputtering (PMS) and by hollow cathode activated EB evaporation (HAD)[J].Surface and Coatings Technology,2000,133-134:555-560. |
| [6] | Szczyrbowski J;Brauer G;Teschner G;Zmelty A .Antireflective coatings on large scale substrates produced by reactive twin-magnetron sputtering[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,1997(0):25-29. |
| [7] | Ohsaki H.;Shimizu J.;Oyama T.;Tachibana Y. .HIGH-RATE DEPOSITION OF SIO2 BY MODULATED DC REACTIVE SPUTTERING IN THE TRANSITION MODE WITHOUT A FEEDBACK SYSTEM[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1996(1/2):213-217. |
| [8] | Song Y Z;Sakurai T;Maruta K;Matnsita A Matsumoto S Saisho S Kikuchi K .Optical and structural properties of dense SiO2,Ta2O5and Nb2O5 thin-films deposited by indirectly reactive sputtering technique[J].Vacuum,2000,59:755-763. |
| [9] | M. Reichling;A. Bodemann;N. Kaiser .Defect induced laser damage in oxide multilayer coatings for 248 nm[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1998(2):264-279. |
| [10] | O'Brien J.;Kelly PJ. .Characterisation studies of the pulsed dual cathode magnetron sputtering process for oxide films[J].Surface & Coatings Technology,2001(0):621-627. |
| [11] | Bartzsch H.;Gloss D.;Bocher B.;Frach P.;Goedicke K. .Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering[J].Surface & Coatings Technology,2003(0):774-778. |
| [12] | 何乐年,徐进,王德苗.反应RF磁控溅射法制备非晶氧化硅薄膜及其特性研究[J].真空,2001(03):16-19. |
| [13] | 许生,侯晓波,范垂祯,赵来,周海军,吴克坚,高文波,颜远全,查良镇.硅靶中频反应磁控溅射二氧化硅薄膜的特性研究[J].真空,2001(05):1-6. |
| [14] | Tabata A;Matsuno N;Suzuoki Y;Mizutani T .Optical properties and structure of SiO2 films prepared by ion-beam sputtering[J].Thin Solid Films,1996,289:84-89. |
| [15] | Jang-Hyuk Hong;Tae-Hyoung Moon;Jae-Min Myoung .Microstructure and characteristics of the HfO_2 dielectric layers grown by metalorganic molecular beam epitaxy[J].Microelectronic engineering,2004(3):263-268. |
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