近年来，国内外一些研究者对添加剂元素与铝元素共掺杂的 ZnO 薄膜开展了许多研究并发现在 AZO薄膜掺入添加剂元素不仅会增强AZO薄膜的光电特性，而且还能优化其晶体结构和表面形貌，某些添加剂元素还可以提高AZO薄膜的多项性能和稳定性，这对研究 AZO 薄膜性能的提高提供了一个更具潜力的研究方向。介绍了 AZO 薄膜的基本结构、基本特性以及光电性能原理。对添加剂元素对 AZO薄膜结构的研究和光电性能的研究进行了归纳和总结，并且与 AZO 薄膜进行了对比。综述了添加剂元素掺入的AZO薄膜目前所采用的磁控溅射法、溶胶-凝胶法和脉冲激光法三种主要制备技术以及其优缺点，同时阐述了不同方法掺入添加剂元素的 AZO 薄膜的研究进展。最后介绍了添加剂元素掺入的AZO薄膜在光电领域的应用，展望了其未来发展与研究趋势。
In recent years, some researchers have carried out many studies on Al doped ZnO thin films with additive ele-ments and found that the properties of AZO thin films with additive elements are better than those of AZO thin films .The research achievements mentioned above are summarized and the basic structure and optoelectronic properties of AZO thin films are introduced .The basic structure and optoelectronic properties of AZO thin films with additive elements are de-scribed and compared with those of AZO thin films .The main preparation technology and advancement of additive ele-ments doped AZO thin films are reported and the developments and the research trends of additive elements doped AZO thin films are prospected.The three main technologies of magnetron sputtering, sol AZO film additive elements mixed into the gel and pulsed laser deposition technique and its advantages and disadvantages are summarised , and the research pro-gress of different methods of AZO thin film doped with the elements are expounded .Finally, the authours introduce the ap-plication of AZO thin film doped additive elements in the field of optoelectronics , the prospect of its future development and research trend.
参考文献
| [1] | Badeker K .Electrical Conductivity and Thermo-Electromotive Force of Some Metallic Ampounds[J].Ann Phy(Leipzip),1907,22(04):749-766. |
| [2] | 成立顺,孙本双,钟景明,何力军,王东新,陈焕铭.ITO透明导电薄膜的研究进展[J].稀有金属快报,2008(03):10-16. |
| [3] | 陈福,赵恩录,张文玲,苟金芳,曾雄伟.AZO导电薄膜的研究进展及应用[J].玻璃,2007(02):13-15,47. |
| [4] | 徐绍亮;庞晓露;杨会生 et al.射频反应磁控溅射法制备 ZnO:Al透明导电薄膜的光电性能[J].稀有金属材料与工程,2011,40(01):451-454. |
| [5] | 石素君,朱德亮,吕有明,曹培江,柳文军,贾芳,马晓翠.氩气退火对氢掺杂AZO薄膜电学性能的影响[J].发光学报,2012(07):742-746. |
| [6] | Cao HT;Pei ZL;Gong J;Sun C;Huang RF;Wen LS .Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering[J].Surface & Coatings Technology,2004(1):84-92. |
| [7] | Jing-Chie Lin;Kun-Cheng Peng;Hsueh-Lung Liao;Sheng-Long Lee .Transparent conducting Sc-codoped AZO film prepared from ZnO:Al-Sc by RF-DC sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2008(16):5349-5354. |
| [8] | Lin W;Ma R X;Shao W et al.Structural,Electrical and Optical Properties of Gd Doped and Undoped ZnO:Al (AZO) Thin Films Prepared by RF Magnetron Sputtering[J].Applied Surface Science,2007,253(11):5179-5183. |
| [9] | Wang, XC;Li, GM;Wang, YH .Synthesis and characterization of well-aligned Cd-Al codoped ZnO nanorod arrays[J].Chemical Physics Letters,2009(4/6):308-312. |
| [10] | 冷春波;卢士香;徐文国 .镉、铝共掺杂纳米氧化锌的合成、性质及其光催化降解性能研究[J].光谱学与光谱分析,2010,30(11):51-52. |
| [11] | Jiang M H;Liu X Y .Structural,Electrical and Optical Prop-erties of A1-Ti Codoped ZnO (ATZO) Thin Films Prepared by RF Magnetron Sputtering[J].Applied Surface Science,2008,255(05):3175-3178. |
| [12] | 许莹,王娟,窦玉博.Al-N共掺杂型ZnO薄膜的制备及其性能研究[J].材料工程,2010(11):11-16. |
| [13] | 袁玉珍,王辉,张化福,刘汉法,刘云燕.膜厚对Zr,Al共掺杂ZnO透明导电薄膜结构和光电性能的影响[J].人工晶体学报,2010(01):169-173. |
| [14] | 周爱萍,刘汉法,张化福.直流磁控溅射法制备铝铬共掺杂氧化锌薄膜及其结构和光电性能的研究[J].人工晶体学报,2010(06):1490-1493,1503. |
| [15] | 范志新.AZO透明导电薄膜的特性、制备与应用[J].真空,2000(05):10. |
| [16] | 孙宜华 .AZO Transparent Conductive Oxide Tar-get Fabrication of Thin Film(AZO透明导电氧化物靶材及其薄膜制备的研究)[D].Wuhan:Huazhong University of Sci-ence and Technology,2009. |
| [17] | 刘耀东,范伟光,谷立娟.脉冲激光法室温下沉积紫外发光AZO薄膜[J].稀有金属材料与工程,2007(z3):440-442. |
| [18] | Hsu C Y;Ko T F;Huang Y M .Influence of ZnO Buffer Layer on AZO Film Properties by Radio Frequency Magnetron Sputte-ring[J].Journal of the European Ceramic Society,2008,28:3065. |
| [19] | 范志新,孙以材,陈玖琳.氧化物半导体透明导电薄膜的最佳掺杂含量理论计算[J].半导体学报,2001(11):1382-1386. |
| [20] | 巩锋 .Study on Properties of Al:ZnO Films Pre-pared by The Sol-Gel Method(溶胶凝胶法制备 Al:ZnO 薄膜及其性能研究)[D].Beijing:Beijing University of Technol-ogy,2003. |
| [21] | 张德恒 .透明导电膜中光吸收边的移动[J].半导体杂志,1998,23(03):34-43. |
| [22] | 马正洪,谭红琳,艾国齐.Ag-Al共掺杂ZnO薄膜的结构及其光学性能的研究[J].热加工工艺,2011(03):33-35,38. |
| [23] | 江民红,刘心宇.[100]取向Al-Ti共掺杂ZnO薄膜的制备与光电性能研究[J].无机材料学报,2008(06):1101-1105. |
| [24] | 陈建林,陈荐,何建军,任延杰,邱玮,陈振华.Al-Sc共掺杂ZnO透明导电薄膜的掺杂机制[J].硅酸盐学报,2011(07):1112-1117. |
| [25] | Tadatsugu Minami;Takashi Yamamoto;Toshihiro Miyata .Highly transparent and conductive rare earth-doped ZnO thin films prepared by magnetron sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2000(1/2):63-68. |
| [26] | 阳生红,蒋志洁,张日理,汤健,王旭升.Al-Y共掺杂ZnO透明导电薄膜制备及光电性能研究[J].中山大学学报（自然科学版）,2011(06):35-38. |
| [27] | 王辉,袁玉珍,张化福,刘汉法,刘云燕,刘俊成.Al-Zr共掺杂ZnO透明导电薄膜制备及光电性能研究[J].光电子·激光,2009(12):1606-1609. |
| [28] | 黄稳,余洲,刘连,张勇,黄涛,闫勇,赵勇.射频溅射工艺参数对AZO薄膜结构和性能的影响[J].功能材料,2012(12):1553-1555,1560. |
| [29] | 贾芳,乔学亮,陈建国,李世涛,王国锋.磁控溅射制备AZO/Ag/AZO透明导电膜的性能研究[J].光电工程,2007(12):38-41. |
| [30] | 吴跃波,罗敏雪,雷声,黄磊.磁控溅射功率对掺Al氧化锌薄膜特性的影响[J].传感器与微系统,2011(06):36-38. |
| [31] | 马晓翠,叶家聪,曹培江,柳文军,贾芳,朱德亮,吕有明.射频溅射功率对AZO薄膜结构及光电特性和热稳定性的影响[J].发光学报,2010(02):235-238. |
| [32] | 张丽伟,卢景霄,段启亮,王海燕,李瑞,靳锐敏,王红娟,张宇翔.磁控溅射法制备AZO薄膜的工艺研究[J].电子元件与材料,2005(08):46-48. |
| [33] | 郭杏元,许生,曾鹏举,谭晓华,严松涛,范垂祯.直流磁控溅射制备大面积AZO透明导电薄膜[J].真空,2010(04):46-50. |
| [34] | 严志宸,张海明,高波,朱彦君.超声喷雾热解法制备铝掺杂氧化锌薄膜[J].人工晶体学报,2010(06):1376-1380. |
| [35] | 李帅;王峰;田伟 et al.Sol-Gel法制备 Al掺杂 ZnO 薄膜及其性能的探究[J].材料导报网刊,2011,6(01):25-29. |
| [36] | Mamta Sharma;R.M. Mehra .Sol-gel derived zinc oxide films alloyed with cobalt and aluminium[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2010(14):p.3725. |
| [37] | 陈兆权,刘明海,刘玉萍,陈伟,罗志清,胡希伟.PECVD制备AZO（ZnO：Al）透明导电薄膜[J].物理学报,2009(06):4260-4266. |
| [38] | 胡少六,江超,龙华,王又青.AZO薄膜双靶PLD沉积及其光学性能分析[J].压电与声光,2004(02):119-121. |
| [39] | 江超,王又青.脉冲激光沉积AZO薄膜及其光学性质研究[J].激光杂志,2008(05):79-80. |
| [40] | Minami T;Suzuki S;Miyata T .Transparent Conducting Impu-rity Co Doped Al:ZnO Thin Films Prepared by Magnetron Sputtering[J].THIN SOLID FILMS,2001,398-399(01):53-58. |
| [41] | 张化福,刘汉法,袁长坤,类成新.铝锆共掺杂氧化锌透明导电薄膜的低温制备及特性研究[J].真空科学与技术学报,2010(03):306-310. |
| [42] | 郭美霞.铝钛共掺杂氧化锌透明导电薄膜的制备与性能研究[J].液晶与显示,2011(02):161-164. |
| [43] | 马瑞新,王海峰,王目孔,康勃,吴中亮.退火气氛对Al-F共掺杂ZnO薄膜结构和光电性能的影响[J].太阳能学报,2011(01):49-53. |
| [44] | 师磊.掺杂工艺对Al-F共掺ZnO薄膜性能的影响[J].国外建材科技,2008(02):56-63. |
| [45] | 彭益文,曾和平,余力.纳米铈-铝共掺杂氧化锌透明薄膜的光学性能研究[J].华南师范大学学报（自然科学版）,2012(04):77-81. |
| [46] | 黄文娟 .Study on the Synthesis and Proper-ties of Al-Co Doped ZnO Thin Films(Al-Co共掺杂ZnO薄膜制备与性能研究)[D].Anhui:University of Anhui,2011. |
| [47] | 孟军霞,马书懿,陈海霞,陶亚明,侯丽莉,贾迎飞,尚小荣.Al掺杂ZnO薄膜的微结构及光学特性研究[J].功能材料,2010(08):1317-1320. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%