硅纳米材料广泛应用于光功能导向的各个领域,发展针对光功能应用及一维硅纳米结构的规模化可控制备方法,实现硅纳米结构的宏量制备,将为硅纳米结构的应用提供材料保障.本文采用简单的化学气相沉积法成功地在Mo网衬底上制备了大面积的硅纳米线(SiNWs),并通过扫描电子显微镜、透射电子显微镜、X射线粉末衍射仪、拉曼光谱仪,对制备的SiNWs进行了详细的研究.通过在低功率紫外光照射下SiNWs对罗丹明B和甲基蓝的光降解能力的研究,发现在Mo网衬底上生长的SiNWs对于有机染料具有很好的降解能力.
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