采用磁控溅射工艺和复合靶技术制备FeCoB-SiO2磁性纳米颗粒膜;利用X射线衍射仪、扫描探针显微镜分析这类薄膜的微结构和形貌特征;采用振动样品磁强计、四探针法、微波矢量分析仪及谐振腔法测量薄膜试样的磁电性能和微波复磁导率;重点对SiO2介质相含量、薄膜微结构对电磁性能产生重要影响的机理做了分析和探讨.结果表明,这类FeCoB-SiO2磁性纳米颗粒膜具有良好的软磁性能和高频电磁性能,2GHz时,磁导率μ＞50,可以应用于高频微磁器件中.
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