AlN是一种性能优异的宽带隙Ⅲ-Ⅴ族氮化物半导体材料,在电、光和机械领域展现了极大的应用前景.结合国内外研究的热点问题和各科研团体最新的研究成果,从AlN的性质、AlN薄膜的制备方法、国内外AlN薄膜的最新研究进展及AlN薄膜的应用等4个方向进行了详细阐述.
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