研究了多种胺类高分子添加剂对焦磷酸盐体系无氰电镀白铜锡工艺及镀层微观形貌的影响.基础镀液的组成为:K4P2O7·3H2O 200～250 g/L,Cu2P2O7·3H2O 16～19 g/L,Sn2P2O712～15 g/L,pH 8.5～8.7.以IEP(水性阳离子季铵盐)、DPTHE(多胺高分子聚合物)和JZ-1(胺类化合物)作添加剂时,均可在较宽的电流密度范围内得到白亮铜锡合金镀层.以IEP作添加剂时,电镀白铜锡的电流密度上限最高为3.70 A/dm2;以DPTHE作添加剂时,电镀白铜锡合金镀层的电流密度下限最低为0.09 A/dm2,可抑制低电流密度区形成金黄色低锡铜锡合金.以IEP和DPTHE作添加剂时,均可使白铜锡合金镀层持续增厚,电镀50 min可得到白亮、无裂纹的镀层,且IEP具有更明显的整平和细化晶粒作用.
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