采用选择氧化法首次制备具有核壳结构的NiSi/SiO2纳米颗粒.通过SEM,TEM,EDX,XRD和VSM等测试手段对材料进行表征.结果表明,用上述方法制备得到的NiSi/SiO2纳米颗粒直径在40～200 nm之间,SiO2壳层厚度约为20 nm.基于选择氧化、结晶和热力学理论对SiO2壳层结构的形成机理进行了阐释.制备得到的NiSi/SiO2纳米颗粒在室温下显示出超顺磁性.
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