用溶胶-凝胶的方法制得(111)取向的PZT铁电薄膜,并喷涂于Pt(111)/Ti/SiO2/Si衬底上.用扫描力显微镜(SFM)的压电响应模式纳米级分辨率地观察到了几乎等间距或中间间距大于两侧的条状畴结构.这主要与晶粒和衬底间的应力应变有关.从这畴结构我们提出铁电畴形核和生长速率模型.其基本过程如下:(1)由于薄膜和底电极间周期性的结构和成分起伏,致使畴结构在此相连处形核.(2)铁电畴横向生长至相临畴相遇,纵向生长至薄膜上表面.(3)在随后的过程中,由于单个畴间的能量差异致使横向生长再次启动.这些过程是连续的,难以正确的区分.
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