概述了物理气相沉积(PVD)技术制备TiAlSiN涂层的研究现状及发展趋势,详细分析了Si元素的添加及Si与Al元素的含量对TiAlSiN涂层的微观结构、力学性能、高温抗氧化性和热稳定性的影响.解决PVD制备TiAlSiN涂层较低的膜基结合力和较大的残余应力等问题应是今后重点研究的方向.
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