通过赫尔槽试验与方槽试验研究了镀液组成和工艺条件对白铜锡电镀层外观与组成的影响.最佳镀液组成与工艺条件为:Cu2P2O7·3H2O 16 ～ 19 g/L,Sn2P2O7 12～15 g/L,K4P2O7·3H2O 200 ～ 250g/L,K2HPO4 60～ 80 g/L,有机胺类添加剂JZ-11.2～1.8 mL/L,pH=8,5～8.7,温度20 ～ 25℃,阴极电流密度1.0 A/dm2.采用该工艺对基体施镀20 min可得到厚度为5.09μm、锡的质量分数为40％～50％的均匀白亮的Cu-Sn合金镀层.Cu-Sn合金镀层的晶体结构以CuSn和Cu41Sn11为主,结晶细致、无微裂纹,显微硬度为372 HV,耐蚀性能比相同厚度的光亮镍镀层好.
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