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用低频扭摆测量了掺氧的超纯Ta的Snoek-Kstcr弛豫.观察到了四种不同类型的S-K弛豫过程.在氧含量较低因而位错具有非饱和的填隙原子气团的条件下出现“SK-1”和“SK-2”弛豫.在氧含量较高的饱和气团条件下出现“SK-4”弛豫,而“SK-5”也属于非饱和气团的条件.本文还观测到随退火温度的提高和氧含量的增加,出现SK-5弛豫的试样有逐渐向sK-4弛豫过渡的趋势.除了SK-1弛豫对退火较不稳定以外,其它弛豫过程均较为稳定.比较了前人的测量结果与本文的实验数据.表明文献报道的Ta的S-K弛豫分别属于本文的不同类型的S-K弛豫.

The Snoek-Kster relaxation processes in oxygen-doped high purity polycrys-talline Ta after plastic deformation were investigated.It was shown that there arefour distinct types of Snoek-Kster relaxation,namely,SK-1 and SK-2 occurringin lower oxygen concentration,i.e.,unsaturated interstitial atmosphere,as sameas peak(1)and(2)in the previous work by the authors;SK-4 in high oxygenconcentration,i.e.,saturated atmosphere and SK-5 in lower oxygen concentration,i.e.,unsaturated atmosphere.The activation parameters of these relaxations weredetermined.As the increasing of the annealing temperature and oxygen content,the gradual transition from SK-5 into SK-4 relaxation can be observed.All relax-ation processes other than SK-1 are stable on annealing.A comparison of resultsbetween previous works and this study was also made.

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